Emitting and negatively-refractive focusing apparatus, methods, and systems
US8773776B2 · kind B2 · utility
11Cited by
64References
55Claims
0Family size
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Key dates
| Filing date | Oct 21, 2008 |
| Grant date | Jul 8, 2014 |
| Priority date | — |
| Expiry date | Sep 18, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Apparatus, methods, and systems provide emitting and negatively-refractive focusing of electromagnetic energy. In some approaches the negatively-refractive focusing includes negatively-refractive focusing from an interior field region with an axial magnification substantially greater than one. In some approaches the negatively-refractive focusing includes negatively-refractive focusing with a transformation medium, where the transformation medium may include an artificially-structured material such as a metamaterial.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.