Vacuum pump exhaust pipe of chemical vapor deposition apparatus and relevant vacuum pump
US8778066B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 27, 2011 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Dec 13, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is a vacuum pump exhaust pipe of a chemical vapor deposition apparatus, wherein two ports of the vacuum pump exhaust pipe are respectively connected to a vacuum pump outlet and a scrubber, and anti-sticking inner pipes are installed inside the exhaust pipe and closely contacted with inner walls of the exhaust pipe. The present invention also relates to a vacuum pump of the chemical vapor deposition apparatus. Blockage hardly occurs in the vacuum pump exhaust pipe of the chemical vapor deposition apparatus and the relevant vacuum pump according to the present invention to solve problems of the easily found blockage in the exhaust pipe, wasting the manpower and the time for clearing the exhaust pipe and the effect to the uptime of the chemical vapor deposition apparatus in the prior arts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.