Method of manufacturing high resolution organic thin film pattern
US8778600B2 · kind B2 · utility
7Cited by
1References
20Claims
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Key dates
| Filing date | Dec 27, 2010 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Mar 26, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/12
Abstract
A method of forming a high resolution organic thin film pattern, the method including forming a first organic layer on a substrate; selectively removing the first organic layer by selectively irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a sacrifice layer; forming a second organic layer on the substrate and the entire surface of the sacrifice layer; and lifting off the second organic layer formed on the sacrifice layer by removing the sacrifice layer using a solvent, and forming the remaining second organic layer as a second organic layer pattern.
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