Film forming method, film forming device, liquid crystal arrangement method, liquid crystal arrangement device, liquid crystal device, liquid crystal device production method and electronic equipment
US8780317B2 · kind B2 · utility
0Cited by
9References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 21, 2009 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Mar 30, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13415
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A film forming device forms a coated film on a substrate by discharging a liquid material in the form of liquid droplets, and causing the liquid droplets to impact on the substrate at a predetermined pitch. The predetermined pitch is determined based on the diameter of the liquid droplets after impact of the liquid droplets on the substrate. Drop marks are reduced and a uniform coated film is formed on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.