Patent · US Active

Cleaning station for atomic force microscope

US8782811B2 · kind B2 · utility

1Cited by

6References

12Claims

0Family size

Assignee

Bruker Nano, Inc. · US

Inventors

Johannes Kindt · Weimar, DE
Daniel Joseph Lyons · Medina, US
Charles Meyer · San Antonio, US
Russ Mead · Lompoc, US

Key dates

Filing date	Apr 27, 2012
Grant date	Jul 15, 2014
Priority date	—
Expiry date	May 29, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG01Q70/00
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.