Plasma discharge self-cleaning filtration system
US8784657B2 · kind B2 · utility
3Cited by
6References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2008 |
| Grant date | Jul 22, 2014 |
| Priority date | — |
| Expiry date | Oct 16, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D29/72
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate strong Shockwaves that disintegrate and dislodge particulate matter located on the surface of the filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.