System for refining UMG Si using steam plasma torch
US8790584B2 · kind B2 · utility
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2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2010 |
| Grant date | Jul 29, 2014 |
| Priority date | — |
| Expiry date | Dec 12, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/3484
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Disclosed is a system for refining UMG Si including a vacuum chamber, a cold crucible disposed within the vacuum chamber, a device disposed within the vacuum chamber to supply Si to the cold crucible, a steam plasma torch disposed above the cold crucible to apply steam plasma formed by introducing a reactive gas into plasma flame by an inert gas to the Si supplied to the cold crucible, and an impurity collector disposed above the cold crucible within the vacuum chamber to collect impurity gas generated in the cold crucible and discharge the collected impurity gas to the outside of the vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.