Fluorene-based resin polymer and photo-sensitive resin composition comprising the same
US8791169B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Jan 27, 2012 |
| Grant date | Jul 29, 2014 |
| Priority date | — |
| Expiry date | Jul 28, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F214/182
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a fluorene-based resin polymer, and a photosensitive resin composition including the same, and the fluorene-based resin polymer according to the exemplary embodiment of the present invention has a high molecular weight, a low acid value, and excellent developing property, adhesive property and stability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.