Patent · US Active

Method for the precise measuring operation of a micromechanical rotation rate sensor

US8794047B2 · kind B2 · utility

1Cited by

4References

13Claims

0Family size

Assignees

Continental Teves AG & Co. OHG · DE
VTI Technologies Oy · FI

Inventors

Stefan Günthner · Frankfurt am Main, DE
Roland Hilser · Kirchheim unter Teck, DE
Ramnath Sivaraman · Frankfurt, DE
Bernhard Schmid · Friedberg, DE
Petri Klemetti · Klaukkala, FI

Key dates

Filing date	Apr 28, 2010
Grant date	Aug 5, 2014
Priority date	—
Expiry date	Mar 2, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG01C19/5712
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method and apparatus for the precise measuring operation of a micromechanical rotation rate sensor, including at least one deflectively suspended seismic mass, at least one drive device for driving the seismic mass, and at least one first and one second trimming electrode element, which are jointly assigned directly or indirectly to the seismic mass, a first electrical trimming voltage (UTO1, UTLO1, UTRO1) being set between the first trimming electrode element and the seismic mass, and a second electrical trimming voltage (UTO2, UTLO2, UTRO2) being set between the second trimming electrode element and the seismic mass, the first and the second electrical trimming voltages being set at least as a function of a quadrature parameter (UT) and a resonance parameter (Uf).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.