Block copolymer and method of forming patterns by using the same
US8795539B2 · kind B2 · utility
7Cited by
2References
13Claims
0Family size
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Key dates
| Filing date | Sep 23, 2011 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | Apr 16, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2438/03
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.