Nanoimprint method

US8795775B2 · kind B2 · utility

Assignee

• AMO GmbH · DE

Inventors

• Namil Koo · Aachen, DE
• Jung Wuk Kim · Aachen, DE
• Christian Moormann · Aachen, DE

Key dates

• Filing date: Feb 25, 2011
• Grant date: Aug 5, 2014
• Expiry date: Oct 27, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24612
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method for applying a patterned coating of resist onto a surface of a substrate, includes embossing flowable resist at least once, wherein the flowable resist is respectively embossed between a patterned surface of a stamp and a carrier, whereby the stamp surface is provided with a patterned resist surface. The stamp carrying a first patterned part of the resist coating and the carrier carrying a second part of the resist coating are separated from each other. The patterned resist coating is transferred, wherein the first patterned part of the resist coating on the surface of the stamp is pressed against the surface of the substrate and the patterned resist coating is transferred onto the surface of the substrate. The first patterned part of the resist coating is cured and a demolding step is performed by separating the stamp from the first patterned part of the resist coating.