AC, RF or pulse excited microdischarge device and array
US8796926B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2007 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | Apr 14, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J17/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An AC, rf, or pulse-excited microdischarge device and array are provide by the invention. A preferred array includes a substrate. A plurality of microdischarge cavities that contain discharge medium are in the substrate. A transparent layer seals the discharge medium in the microdischarge cavites. Electrodes stimulate the discharge medium. The microdischarge cavities are physically isolated from the electrodes by dielectric and arranged relative to the electrodes such that ac, rf, or pulsed excitation applied to the electrodes stimulates plasma excitation of the discharge medium. The microdischarge cavities are sized to produce plasma within the microdischarge cavities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.