Patent · US Active

Radiation-sensitive resin composition

US8802348B2 · kind B2 · utility

0Cited by
2References
10Claims
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Assignee

Inventors

Key dates

Filing dateFeb 7, 2010
Grant dateAug 12, 2014
Priority date
Expiry dateAug 9, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/2041
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.