Method of controlling semiconductor process distribution
US8805567B2 · kind B2 · utility
3Cited by
6References
22Claims
0Family size
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Key dates
| Filing date | Sep 23, 2011 |
| Grant date | Aug 12, 2014 |
| Priority date | — |
| Expiry date | Oct 2, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/80
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method of controlling process distribution of a semiconductor process includes receiving process distribution data representing the process distribution of the semiconductor process, receiving a parameter related to the process distribution, generating a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the parameter, and modifying a process variable affecting the process distribution based on the virtual metrology model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.