Arrangement for holding a substrate in a material deposition apparatus

US8808402B2 · kind B2 · utility

Assignee

• OSRAM Opto Semiconductors GmbH · DE

Inventors

• Johannes Krijne · Best, NL
• Erwin Eiling · Vaals, NL
• Karl-Heinz Hohaus · Linnich, DE
• Wolfgang Goergen · Alsdorf, DE
• Andreas Lovich · Augsburg, DE
• Marc Philippens · Regensburg, DE
• Richard Scheicher · Thierhaupten, DE
• Ansgar Fischer · Königsbrunn, DE
• Martin S. Mueller · Torrance, US

Key dates

• Filing date: Mar 29, 2010
• Grant date: Aug 19, 2014
• Expiry date: Sep 4, 2030

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/50
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).