Rapid solid-state metathesis routes to nanostructured silicon-germainum
US8808658B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 8, 2011 |
| Grant date | Aug 19, 2014 |
| Priority date | — |
| Expiry date | Oct 3, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods for producing nanostructured silicon and silicon-germanium via solid state metathesis (SSM). The method of forming nanostructured silicon comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and an alkaline earth metal silicide into a homogeneous powder, and initating the reaction between the silicon tetraiodide (SiI4) with the alkaline earth metal silicide. The method of forming nanostructured silicon-germanium comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and a germanium based precursor into a homogeneous powder, and initiating the reaction between the silicon tetraiodide (SiI4) with the germanium based precursors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.