Patent · US Active

Rapid solid-state metathesis routes to nanostructured silicon-germainum

US8808658B2 · kind B2 · utility

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Key dates

Filing dateJun 8, 2011
Grant dateAug 19, 2014
Priority date
Expiry dateOct 3, 2031

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB22F2998/10
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Methods for producing nanostructured silicon and silicon-germanium via solid state metathesis (SSM). The method of forming nanostructured silicon comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and an alkaline earth metal silicide into a homogeneous powder, and initating the reaction between the silicon tetraiodide (SiI4) with the alkaline earth metal silicide. The method of forming nanostructured silicon-germanium comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and a germanium based precursor into a homogeneous powder, and initiating the reaction between the silicon tetraiodide (SiI4) with the germanium based precursors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.