Photoresist composition and method of manufacturing array substrate using the same
US8808963B2 · kind B2 · utility
0Cited by
9References
14Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Mar 17, 2011 |
| Grant date | Aug 19, 2014 |
| Priority date | — |
| Expiry date | Jun 18, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.