Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers
US8809111B2 · kind B2 · utility
8Cited by
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20Claims
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Key dates
| Filing date | Oct 20, 2010 |
| Grant date | Aug 19, 2014 |
| Priority date | — |
| Expiry date | Aug 3, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/151
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and compositions for obtaining patterned structures comprising fluorine-containing polymeric materials. The fluorine-containing polymeric materials have sufficient fluorine content such that the materials can be patterned using conventional photolithographic/pattern transfer methods and maintain desirable mechanical and physical properties. The patterned structures can be used, for example, in light-emitting devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.