Patent · US Active

Method for deposition of at least one electrically conducting film on a substrate

US8809192B2 · kind B2 · utility

33Cited by

3References

10Claims

0Family size

Assignee

KONINIKLIJKE PHILIPS N.V. · NL

Inventors

Dietrich Bertram · Aachen, DE
Jochen Stollenwerk · Eijsden, NL
Johannes Krijne · Best, NL
Holger Schwab · Ingelfingen, DE
Edward Willem Albert Young · Eijsden, NL
Jeroen Henri Antoine Maria Van Buul · Budel, NL
Andres Gasser · Aachen, DE
Konrad Wissenbach · Würselen, DE
Christian Vedder · Aachen, DE
Norbert Pirch · Aachen, DE

Key dates

Filing date	Jan 11, 2010
Grant date	Aug 19, 2014
Priority date	—
Expiry date	Oct 23, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH10K71/162
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

A method for deposition of at least one electrically conducting film on a substrate, wherein the method includes the steps of: selecting a layer of a film material, wherein the layer includes a mask on a front side, and wherein the layer and the mask are one piece; positioning the front side of the layer upon the substrate; applying at least one laser pulse onto a back side of the layer, so as to melt and to vaporize at least parts of the layer such that melt droplets are propelled toward and deposited upon the substrate; and forming the film, wherein at least one slot of the mask limits the distribution of the melt droplets.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.