Plasma chemical reactor
US8815047B2 · kind B2 · utility
1Cited by
2References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2008 |
| Grant date | Aug 26, 2014 |
| Priority date | — |
| Expiry date | Oct 5, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma chemical reactor includes a chamber for providing a plasma reaction space, and a cathode assembly coupled at one side to a wall surface of the chamber and supporting a substrate at the other side such that the substrate is positioned at a center inside the chamber, and installed to enable height adjustment such that the substrate can maintain a horizontal state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.