Color filter manufacturing method, patterned substrate manufacturing method, and small photomask
US8815477B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 2010 |
| Grant date | Aug 26, 2014 |
| Priority date | — |
| Expiry date | Jun 11, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.