Patent · US Active

Load port

US8821098B2 · kind B2 · utility

4Cited by
7References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 1, 2009
Grant dateSep 2, 2014
Priority date
Expiry dateJan 29, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67772
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A load port is disclosed which allows a wafer to be transferred between the inside of a FOUP and the inside of a semiconductor fabrication apparatus even during a purge operation. The load port is provided adjacent the semiconductor fabrication apparatus in a clean room and includes a purge stage having a purge port through which a gas atmosphere in the FOUP is replaced into nitrogen gas or dry air, an opener stage provided in a juxtaposed relationship with the purge stage and having an opening communicating with the inside of the semiconductor fabrication apparatus and a door section capable of opening and closing the opening, and a moving mechanism for moving the FOUP between the purge stage and the opener stage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.