Ion beam sputter target and method of manufacture
US8821701B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Jun 2, 2010 |
| Grant date | Sep 2, 2014 |
| Priority date | — |
| Expiry date | Dec 11, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.