Thermal annealing process
US8821738B2 · kind B2 · utility
7Cited by
2References
9Claims
0Family size
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Key dates
| Filing date | Jul 12, 2012 |
| Grant date | Sep 2, 2014 |
| Priority date | — |
| Expiry date | Jan 3, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/947
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; annealing the film in a gaseous atmosphere containing ≧20 wt % oxygen; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.