Patent · US Active

Polymeric materials and methods for making the polymeric materials

US8822123B2 · kind B2 · utility

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12References
13Claims
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Key dates

Filing dateJul 13, 2012
Grant dateSep 2, 2014
Priority date
Expiry dateJul 13, 2032

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0236
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Polymeric materials, methods for making the polymeric materials, and photoresist formulations utilizing the polymeric materials are disclosed. In one aspect, a polymeric material is provided including a condensation product of a reaction mixture comprising an aldehyde with a phenolic monomer composition comprising m-cresol, p-cresol, 3,5-dimethyl phenol, and 2,5-dimethyl phenol. The polymeric material may be further contacted with a photoactive compound and a solvent to form a photoresist formulation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.