Implant, and method and system for producing such an implant
US8827703B2 · kind B2 · utility
3Cited by
100References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 18, 2002 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | Sep 15, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/5191
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An implant and a method of producing the implant are provided. The implant can have at least one outer surface extending in its longitudinal direction. The implant can comprise an underlying wave pattern, an intermediate wave pattern, and a microscopic roughening layer. The underlying wave pattern can have waves that extend substantially in the longitudinal direction. Further, the intermediate wave pattern can be formed on the waves of the underlying wave pattern. Additionally, the microscopic roughening layer can be formed on top of the underlying wave pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.