Patent · US Active

Layer system that can be annealed and method for producing the same

US8828194B2 · kind B2 · utility

2Cited by
8References
10Claims
0Family size

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Key dates

Filing dateSep 21, 2005
Grant dateSep 9, 2014
Priority date
Expiry dateApr 20, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31663
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.