Method for making a retarder
US8828650B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2012 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | Nov 23, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for making a retarder includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable prepolymer that has a plurality of reactive functional groups and a functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask; (d) removing the patterned mask; (e) exposing the photocurable layer to cure second regions of the photocurable layer so as to form a microstructure; (f) forming an alignment layer on the microstructure; (g) forming a liquid crystal layer on the alignment layer; and (h) curing the liquid crystal layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.