Atmospheric molecular contamination control with local purging
US8830486B2 · kind B2 · utility
3Cited by
0References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2012 |
| Grant date | Sep 9, 2014 |
| Priority date | — |
| Expiry date | Sep 8, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.