Versatile high aspect ratio actuatable nanostructured materials through replication
US8833430B2 · kind B2 · utility
6Cited by
3References
23Claims
0Family size
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Key dates
| Filing date | Jun 26, 2009 |
| Grant date | Sep 16, 2014 |
| Priority date | — |
| Expiry date | May 13, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of forming a nanostructured surface, including providing an original nanostructured surface having an array of high aspect ratio structures formed on a planar substrate; forming a negative replica mold of the original nanostructured surface, where the negative replica mold includes a flexible material; deforming the negative replica mold; and using the deformed negative replica mold to form a deformed replica of the original nanostructured surface, where the deforming step is performed at least one of before, during, or after introducing a material for forming the deformed replica into the negative replica mold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.