Dosimetry implant for treating restenosis and hyperplasia
US8834338B2 · kind B2 · utility
6Cited by
20References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2007 |
| Grant date | Sep 16, 2014 |
| Priority date | — |
| Expiry date | Oct 20, 2030 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N2005/1019
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The present invention discloses a method of selectively providing radiation dosimetry to a subject in need of such treatment. The radiation is applied by an implant comprising a body member and 117mSn electroplated at selected locations of the body member, emitting conversion electrons absorbed immediately adjacent selected locations while not affecting surrounding tissue outside of the immediately adjacent area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.