Patent · US Active

Apparatus for manufacturing semiconductor wafer

US8834582B2 · kind B2 · utility

1Cited by
0References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 13, 2012
Grant dateSep 16, 2014
Priority date
Expiry dateOct 20, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67766
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present invention provides an apparatus for manufacturing semiconductor wafer comprising at least two manipulators, at least one set of chemical gas/liquid distribution unit and an air circulating and filtering unit. The air circulating and filtering unit is separated into three regions, including the front region, the middle region, and the side region, which are controlled by respective control electric motors to achieve uniform air flow and uniform pressure in the respective regions. The cleaning degree in the internal of the apparatus can be improved by the regional control of the air circulating and filtering unit; the wafer transport efficiency can be enhanced by the double-armed manipulators having multiple degrees of freedom; and the product yield per unit area can be increased by the chemical gas/liquid distribution unit providing stable and uniform gas/liquid flow and pressure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.