Patent · US Active

Removal of krypton and xenon impurities from argon by MOF adsorbent

US8834607B2 · kind B2 · utility

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Key dates

Filing dateOct 29, 2010
Grant dateSep 16, 2014
Priority date—
Expiry dateOct 29, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B2210/0085
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Disclosed is a system and method for removing trace levels of krypton and xenon from argon by using metal organic framework (MOF) adsorbents.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.