Photodamage mitigation compounds and systems
US8834847B2 · kind B2 · utility
4Cited by
33References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2011 |
| Grant date | Sep 16, 2014 |
| Priority date | — |
| Expiry date | Mar 27, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2333/916
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Compositions, devices, systems and methods for reducing and/or preventing photo-induced damage of one or more reactants in an illuminated analytical reaction by addition of one or more photoprotective compounds to the reaction mixture and allowing the reaction to proceed for a period that is less than a photo-induced damage threshold period.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.