Manufacturing method for solar cell
US8835210B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Nov 27, 2013 |
| Grant date | Sep 16, 2014 |
| Priority date | — |
| Expiry date | Nov 27, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
Abstract
The present invention reduces the time required to manufacture a solar cell. After etching main surfaces (10B1, 10B2) of a crystalline silicon substrate (10B) using one etching solution, the main surfaces (10B1, 10B2) of the crystalline silicon substrate (10B) are etched at a lower etching rate than the etching performed using the one etching solution by using another etching solution that has a higher concentration of etching components than the one etching solution. In this way, a textured structure is formed in the main surfaces (10B1, 10B2) of the crystalline silicon substrate (10B).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.