Illumination system for use in a stereolithography apparatus
US8836916B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 8, 2010 |
| Grant date | Sep 16, 2014 |
| Priority date | — |
| Expiry date | May 10, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70391
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.