Management method and system for exposure apparatus having alarm based on inclination amount and deviation from aligned position
US8836919B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2011 |
| Grant date | Sep 16, 2014 |
| Priority date | — |
| Expiry date | Dec 19, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70533
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect to an optical axis of an exposure optical system at the time of exposure. The method can include making a determination on the inclination amount based on a predetermined condition. The method can include making a determination on the correction amount based on the predetermined condition. In addition, the method can include issuing an alarm when the inclination amount and the correction amount both satisfy the condition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.