Continuous mass flow gas replenishment for gas lasing devices
US8837549B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 2012 |
| Grant date | Sep 16, 2014 |
| Priority date | — |
| Expiry date | Dec 5, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/7837
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Continuous mass flow gas replenishment may be implemented in a gas lasing device, such as a gas laser or amplifier, by using a restrictive orifice to bleed one or more gases into a reservoir and/or discharge chamber of the gas laser or amplifier at a predefined mass flow rate. The mass flow rate is a function of the pressure drop across the restrictive orifice resulting from the pressure differential between the depleted gas and the source gas. Thus, gases may be added as needed such that the gas total pressure, as well as the constituent partial pressures, is maintained within a desired range throughout the laser or amplifier fill lifetime. The continuous mass flow gas replenishment may thus make up the lost partial pressure of reactive gases in gas lasing devices in a manner that is less complicated and is less expensive than other continuous flow methodologies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.