Optoelectronic devices having electrode films and methods and system for manufacturing the same
US8845866B2 · kind B2 · utility
0Cited by
15References
26Claims
0Family size
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Key dates
| Filing date | Dec 22, 2005 |
| Grant date | Sep 30, 2014 |
| Priority date | — |
| Expiry date | Dec 30, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/35
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and system for DC magnetron sputtering deposition of films on plastic substrates. The method includes using a shield to block deposition in a spatial region corresponding to a plasma region formed during magnetron sputtering. An optoelectronic device including an amorphous electrode film is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.