Tools and methods for forming semi-transparent patterning masks
US8845912B2 · kind B2 · utility
11Cited by
2References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 22, 2011 |
| Grant date | Sep 30, 2014 |
| Priority date | — |
| Expiry date | May 10, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2995/0026
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.