Patent · US Active

High throughput fabrication of nanoparticles

US8846077B2 · kind B2 · utility

8Cited by
5References
29Claims
0Family size

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Key dates

Filing dateDec 17, 2012
Grant dateSep 30, 2014
Priority date—
Expiry dateDec 17, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/906
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

This application provides a high throughput method of making nanoparticles that utilizes plates comprising wells (e.g., 96-well plates).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.