EUV radiation generating apparatus and operating methods
US8847182B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2013 |
| Grant date | Sep 30, 2014 |
| Priority date | — |
| Expiry date | Mar 15, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0092
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The invention relates to extreme ultraviolet “EUV” radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.