System and method for authenticating an optical pattern
US8848973B2 · kind B2 · utility
1Cited by
176References
28Claims
0Family size
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Key dates
| Filing date | Jun 26, 2013 |
| Grant date | Sep 30, 2014 |
| Priority date | — |
| Expiry date | Jun 26, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F13/003
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for authenticating an optical pattern created by exposing a magnetically sensitive material to one or more magnetic field sources. The system includes illumination sources configured to illuminate the optical pattern, sensors configured to generate sensed optical characteristic data when the optical pattern is illuminated, a memory configured to store a reference optical data associated with a reference optical pattern, and a processor configured to access the memory and compare the reference optical data to the sensed optical characteristic data in order to authenticate the optical pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.