Method of synthesizing hybrid metal oxide materials and applications thereof
US8852690B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 15, 2005 |
| Grant date | Oct 7, 2014 |
| Priority date | — |
| Expiry date | Dec 18, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/86
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to metal oxide coating materials that can be used as thin film thin film coatings on various substrate surfaces. The invention also concerns a method of making metal oxide material which are stable in aqueous phase and that can be deposited on a substrate by liquid phase deposition, such as spin-on deposition. The new materials can be patterned lithographically or non-lithographically and are applicable for building up various electronic and opto-electronic device structures, such as anti-reflection layers, high-k interlayer and gate oxide structures for ICs, etch stop layer, CMP stop layer, solar cells, OLEDs packaging, optical thin film filters, optical diffractive grating applications and hybrid thin film diffractive grating structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.