Apparatus for depositing a thin film of material on a substrate and regeneration process for such an apparatus
US8858713B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 17, 2010 |
| Grant date | Oct 14, 2014 |
| Priority date | — |
| Expiry date | May 9, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49718
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is an apparatus for depositing a thin film of material on a substrate and a regeneration process. The apparatus includes a chamber, a cryogenic panel disposed inside the chamber, a sample holder able to support a substrate, a gas injector able to inject a gaseous precursor into the chamber, a first trap connected to the vacuum chamber and able to trap a part of the gaseous precursor released by the cryogenic panel, the first trap having a fixed pumping capacity S1. The apparatus for depositing a thin film of material on a substrate includes a second trap having a variable pumping capacity S2 able to be regulated in function of the gaseous precursor partial pressure, the first and second trap providing a total pumping capacity S=S1+S2 sufficient to maintain the gaseous precursor partial pressure in the vacuum chamber under a determined pressure PL.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.