Magnetic patterning method and system
US8859059B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2009 |
| Grant date | Oct 14, 2014 |
| Priority date | — |
| Expiry date | Oct 2, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0198
- WIPO fieldBiotechnology
- WIPO sectorChemistry
Abstract
The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles, while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.