Patent · US Active

Distortion tolerant processing

US8859312B2 · kind B2 · utility

0Cited by
2References
16Claims
0Family size

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Key dates

Filing dateOct 1, 2007
Grant dateOct 14, 2014
Priority date
Expiry dateJan 29, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of manufacturing an integrated circuit (IC) for driving a flexible display includes depositing a pattern of spatially non-repetitive features in a first layer on a flexible substrate, said pattern of spatially non-repetitive features not substantially regularly repeating in both of two orthogonal directions (x,y) in the plane of the substrate; depositing a pattern of spatially repetitive features in a second layer on said first layer; aligning said second layer and said first layer so as to allow electrical coupling between said non-repetitive features and said repetitive features, wherein distortion compensation is applied during deposition of said repetitive features to enable said alignment.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.