Alignment system and method for operating the same
US8860799B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2011 |
| Grant date | Oct 14, 2014 |
| Priority date | — |
| Expiry date | Apr 7, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment system includes a stage configured to retain an object, an image-capturing device configured to capture the image of the field of view of the microscope, and a processing module configured to generate a virtual mask and superimpose the virtual mask with the image of the object. In one embodiment of the present invention, a method for operating a virtual mask system includes the steps of generating a virtual mask, placing a first object on a stage, capturing at least one image of the first object, and superimposing the virtual mask with the image of the first object by adjusting a position or an inclined angle of the stage or adjusting a capturing position of an image-capturing device by considering at least the virtual mask and the image of the first object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.