Apparatus and method for smoothly coating substrates

US8863684B2 · kind B2 · utility

Assignees

• Stangl Semiconductor Equipment AG · DE
• Würth Solar GmbH & Co. KG · DE

Inventors

• Wolfgang Stangl · Schweinhub, DE
• Hans-Jürgen Stangl · Bad Liebenzell, DE

Key dates

• Filing date: Feb 13, 2007
• Grant date: Oct 21, 2014
• Expiry date: Feb 5, 2031

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6715
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The surface of a substrate may be smoothly covered with a liquid when the substrate is fixed in a holder which together with forms, together with the surface of the substrate, a process volume into which the liquid may be introduced onto the surface of the substrate by means of a wetter, and when the holder including the substrate is set in a swaying motion by means of a swayer, so that the liquid will smoothly spread on the surface of the substrate. By the swaying motion, concentration of the volume of liquid at a specific location of the substrate surface is prevented, since the direction of motion of the liquid changes constantly.