Silicon surface texturing method for reducing surface reflectance
US8865017B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2013 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Oct 22, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method of texturing a surface of a crystalline silicon substrate is provided. The method includes immersing a crystalline silicon substrate into an aqueous alkaline etchant solution to form a pyramid shaped textured surface, with (111) faces exposed, on the crystalline silicon substrate. The aqueous alkaline etchant solution employed in the method of the present disclosure includes an alkaline component and a nanoparticle slurry component. Specifically, the aqueous alkaline etchant solution of the present disclosure includes 0.5 weight percent to 5 weight percent of an alkaline component and from 0.1 weight percent to 5 weight percent of a nanoparticle slurry on a dry basis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.